SLEEP MASK / female genesis 8.1 / zpac obj highpoly
CLO 3D / Marvelous Designer native ZPAC info:
• Software: CLO 3D v2024.1.112
• Simulation mode: CPU (default)
• Avatar: default Genesis 8.1 female, 1 mm skin offset
• Pose: standard A-pose
• Clothing geometry: quads, raw highpoly, 3 mm particle distance
• Retopology or auto-remesh: no
• Textures: default CLO 3D library, 3D seamlines in normal map
• Colorway: white
• Saved without avatar
OBJ export info:
• Avatar: removed
• Rigged: no
• Scale: cm (DAZ Studio), 100%, moved to ground center
• Geometry: quads, single object, thin unweld + thick unweld (2 separate versions)
• Polycount (thin): faces = 2,679; vertices = 2,924
• Retopology or auto-remesh: no
• Unwrapped UVs: 4096x4096, non-overlapping
• UV Maps: diffuse, normal
• UV fill texture seams: 5 px
• Colorway: white
If you have any questions or suggestions, feel free to reach out to me! I’ll be happy to
assist you and respond as quickly as possible. I would also greatly appreciate your feedback,
as it allows me to continually improve an
SLEEP MASK / female genesis 8.1 / zpac obj highpoly
SLEEP MASK / female genesis 8.1 / zpac obj highpoly
CLO 3D / Marvelous Designer native ZPAC info:
• Software: CLO 3D v2024.1.112
• Simulation mode: CPU (default)
• Avatar: default Genesis 8.1 female, 1 mm skin offset
• Pose: standard A-pose
• Clothing geometry: quads, raw highpoly, 3 mm particle distance
• Retopology or auto-remesh: no
• Textures: default CLO 3D library, 3D seamlines in normal map
• Colorway: white
• Saved without avatar
OBJ export info:
• Avatar: removed
• Rigged: no
• Scale: cm (DAZ Studio), 100%, moved to ground center
• Geometry: quads, single object, thin unweld + thick unweld (2 separate versions)
• Polycount (thin): faces = 2,679; vertices = 2,924
• Retopology or auto-remesh: no
• Unwrapped UVs: 4096x4096, non-overlapping
• UV Maps: diffuse, normal
• UV fill texture seams: 5 px
• Colorway: white
If you have any questions or suggestions, feel free to reach out to me! I’ll be happy to
assist you and respond as quickly as possible. I would also greatly appreciate your feedback,
as it allows me to continually improve an